Smart Performance

High-Sensitivity Ion Source

The effect of the filament’s electric potential on the ion source is reduced by placing more distance between the filament and ion source box. In addition, a shield blocks out radiant heat generated from the filament to ensure the ion source box temperature remains uniform. Since this prevents any active spots within the ion source, it provides higher sensitivity for analysis. (Patent: US7939810)


OFF-AXIS Ion Optics

Lower detection limits are achieved by OFF-AXIS Ion Optics (Patent Pending). Meta-stable and neutral ions are removed without sacrificing sensitivity. Helium buffer gas is not required in the CID cell.


High-Speed Scanning Control (Advanced Scanning Speed Protocol, ASSPTM)

ASSP achieves scan speeds of 20,000 u/second. The rod bias voltage is dynamically optimized during ultrahigh-speed data acquisition, thereby minimizing the drop in sensitivity that would otherwise occur above 10,000 u/second. This is necessary for maintaining sensitivity at high scan speeds and acquiring superior mass spectra when performing product ion scans or simultaneous scan and MRM measurement in the Scan/MRM mode. (Patent: US6610979). Scan/MRM simultaneous analysis is possible by coupling high speed scanning with high speed MRM.

Sensitivity and Repeatability in Single GC/MS Mode

The high-efficiency ion source provides the foundation of an ion generation and transmission system, which creates and then delivers ions to the detector, resulting in a GC/MS with the maximum possible sensitivity and repeatability. These features are not realized just for MRM measurements by GC/MS/MS, but also for scan and SIM measurements in single quadrupole modes, even with the most reactive compounds.

* Appearance and specifications are subject to change without notice.


For Research Use Only. Not for use in diagnostic procedures.


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