ICP Inductively Coupled Plasma Method
Inorganic contaminants like V, Cr, Co, Ni, Cd, and Mo likely to be present on the orthopedic implants can be of medical risk for the patient by transition into the human body. Such elements can be quickly monitored by ICP methods. Two different ICP techniques, depending of the requirements, are most often used ICP-OES and ICP-MS. Designed for high stability and lowest running costs.
ICP-OES for Simultaneous Element Analysis
The Inductively Coupled Plasma Optical Emission Spectroscopy (ICP-OES) analysis method uses a high-frequency inductively coupled plasma as excitation source for the atoms to generate an emission spectrum.
ICP-MS for lowest Detection Limits
The Inductively Coupled Plasma Mass Spectrometry (ICP-MS) analysis method uses the plasma as ionization source and a Mass Spectrometer as mass/charge filter device to identify and to quantify the elements of interest in the implant extract.